A new HEX Physical Vapor Deposition (PVD) system from Korvus Technology has been installed at the Politecnico di Torino, within the Department of Applied Science and Technology (DISAT)—specifically for the Electrochemistry group led by Professor Teresa Gatti. The primary use of this versatile machine will be to evaporate metallic contacts for optoelectronic devices and to produce thin films of inorganic, hybrid, and organic materials as the active layers of such devices.
The system is currently equipped with a thermal evaporator and an organic material evaporator, as well as a microbalance for deposition calibration. There are plans to add an RF magnetron to the system in the future for the deposition of non-conductive materials. Thanks to the modularity of the HEX system, adding components is a straightforward process that does not involve structural modifications or additional integration costs. The system was also supplied with an integration kit for a glove box.
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